Fully Automatic Roll-to-Plate Imprinting Line for High-Throughput Nanoimprint Lithography with Customizable Pressure

Dettagli:

Luogo di origine: Cina
Marca: OSMANUV
Certificazione: ISO9001
Numero di modello: Specifica

Termini di pagamento e spedizione:

Quantità di ordine minimo: 1 insieme
Prezzo: Negoziabile
Imballaggi particolari: Imballaggio in legno
Tempi di consegna: 30-45 giorni
Termini di pagamento: T/T
Capacità di alimentazione: Negoziazione
Miglior prezzo Contatto

Informazioni dettagliate

Velocità di rivestimento: Ad alta velocità Diametro di gomma: 100mm
imballaggio: Custodia in legno standard Larghezza di lavoro: 600/1000/1300
Rullo di dosaggio: 164mm*1450mm Energia: 45 kW
Qty del rullo: 2 pezzi Scatola elettrica: scatola elettrica indipendente
Evidenziare:

fully automatic nanoimprint lithography machine

,

roll-to-plate UV coating machine

,

customizable pressure imprinting line

Descrizione di prodotto

FULLY AUTOMATIC ROLL-TO-PLATE IMPRINTING LINE – HIGH-VOLUME NANOIMPRINT LITHOGRAPHY FOR OPTICS & DISPLAY
Product Overview

This imprinting production line is designed for high-throughput, high-resolution replication of micro/nanostructures using UV nanoimprint lithography (NIL) or thermal imprinting. It supports rigid substrates (silicon, glass, metal) and flexible films (PET, PI, PEN). The system integrates coating, alignment, imprinting, curing, and demolding. Imprinting pressure, temperature, UV dose, and number of stations are fully customizable for various resin systems and pattern sizes.

Technical Specifications
Parameter Standard Value / Range Customization Option
Imprint technology UV-NIL / Thermal NIL Hybrid UV+thermal customizable
Max substrate size 300 mm × 300 mm (square) / 8″ wafer Customizable up to 500 ×500 mm
Imprint pressure 0.5 - 10 bar Customizable up to 50 bar
Temperature range (thermal) RT - 200°C Customizable up to 350 °C
UV intensity 50 - 500 mW/cm² Customizable wavelength & intensity
Alignment accuracy ± 5 μm (std) / ± 0.5 μm (high-precision) Customizable optical alignment
Production throughput 60 - 120 substrates/hour Depends on customizable cycle time
Imprint area uniformity ≥ 95% Customizable multi-zone pressure control
Power supply AC 400V / 50Hz (3-phase) Customizable to 480V / 60Hz
Applications
  • Diffractive optical elements (DOE) & metalenses
  • Augmented reality (AR) / virtual reality (VR) waveguide manufacturing
  • Anti-reflective (AR) & hydrophobic surfaces
  • Biomedical microfluidic devices
  • Flexible electronics & printed sensors
  • Customizable for large-area display optical films
Customization Options

We provide full production line customization including:

  • Number of imprint stations (single‑stage to multi‑step)
  • Substrate transfer method (robot, conveyor, roll-to-roll)
  • Resin dispensing type (spin, slot-die, spray - customizable)
  • Imprint stamp (soft PDMS, hard quartz, Ni shim) - customizable stamp docking
  • Cleanroom integration (ISO 5 to ISO 8 - customizable)
  • Factory automation interface (SECS/GEM, OPC UA - customizable)
Key Features
  • High residual layer uniformity < ± 5%
  • Low imprint force option for fragile stamps
  • Real‑time force & temperature feedback control
  • Automatic stamp cleaning cycle (customizable interval)
  • Recipe‑based operation with barcode or RFID tracking
  • Customizable safety enclosure & light curtains
Support and Services
  • Global remote diagnostics (VPN / secure tunnel)
  • On‑site commissioning & operator training (up to 5 days included)
  • Process transfer support - resin & stamp supplier matching
  • Customizable maintenance contract (quarterly / semi‑annual)
  • 24‑month warranty on imprinting chamber & actuators
Packing and Shipping
  • Anti‑vibration crate with humidity control
  • Vacuum‑sealed desiccant bags for critical optics
  • Shipping: FOB or CIF - customizable pallet labeling & export packaging
  • Lead time: standard 6 weeks, customized lines 10 -14 weeks
Frequently Asked Questions
Q1: Can I imprint 3D multi‑level structures?
A: Yes - multi‑step imprinting with alignment is customizable.
Q2: Does it support roll‑to‑roll?
A: The standard is roll‑to‑plate; full R2R configuration is customizable.
Q3: Can I use my own UV resin?
A: Yes - UV intensity, exposure time and atmosphere (N₂ purge) are programmable and customizable.

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